Device for the generation of a plasma

Details Device for the generation of a plasma Device for the generation of a plasma

1990-03-29

1992-09-08

LaRoche, Eugene R.

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

315 39, 31511151, 315248, 31323131, 313307, H05H 146

Patent

active

051461374

ABSTRACT:
The invention relates to a device for the generation of a plasma by means of circularly polarized high frequency waves. These high frequency waves are generated by means of voltages having a phase rotation of 90.degree..

REFERENCES:
patent: 3283205 (1966-11-01), De Bolt
patent: 3614525 (1971-10-01), Uleski
patent: 4160978 (1979-07-01), DuHamel
patent: 4691662 (1987-09-01), Roppel et al.
patent: 4792732 (1988-12-01), O'Louglin
J. L. Vossen, "Glow Discharge Phenomena in Plasma Etching and Plasma Deposition", J. Electrochem. Soc.: Solid-State and Technology (Feb. 1979), pp. 319, 320.
Mitsuo Kawamura et al., "A Capacitively Coupled RF-Excited CW-HCN Laser", IEEE Journal of Quantum Electronics, vol. QE-21, No. 11 (Nov. 1965), pp. 1833-1837.
R. W. Boswell, "Very Efficient Plasma Generation by Whistler Waves Near the Lower Hybrid Frequency" Plasma Physics and Controlled Fusion, vol. 26, No. 10, pp. 1147-1162, 1984.
G. N. Harding et al, "A Study of Helicon Waves in Indium", Proc. Phys. Soc., 1965, vol. 85.
R. W. Boswell et al, "Fast Etching of Silicon in a Plasma Reactor with Ripe Source" Le Vide, Les Couches Minces, Supplement au No. 246, Mar., Apr. 1989, pp. 160-162.
Oechsner, H., "Electron Cyclotron Wave Resonances and Power Absorption Effects in Electrodeless Low Pressure H.F. Plasmas with a Superimposed Static Magnetic Field," Plasma Physics, vol. 16, pp. 835-844 (1974).
Uesugi, T. et al., "A tandem radio-frequency plasma torch," J. Appl. Phys., 64(8), 15 Oct. 1988, pp. 3874-3878.

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