Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Reexamination Certificate
2007-11-27
2007-11-27
Nguyen, Nam (Department: 1753)
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
C204S298180, C204S298230, C204S298250, C204S298350
Reexamination Certificate
active
10508196
ABSTRACT:
The invention relates to a device for the targeted application of deposition material onto a substrate, especially for focusing the sputter flux onto a narrow angular range in a PVD-system. The invention is characterized in that the deposition material is directed through a filter structure (90) having several channel-shaped individual structures (60) onto said substrate (30), whereby the streams of material are limited to a narrow angle range.
REFERENCES:
patent: 3627569 (1971-12-01), Beecham
patent: 4776868 (1988-10-01), Trotter et al.
patent: 5344352 (1994-09-01), Horne et al.
patent: 5415753 (1995-05-01), Hurwitt et al.
patent: 5518594 (1996-05-01), Marcquart et al.
patent: 5643428 (1997-07-01), Krivokapic et al.
patent: 5885425 (1999-03-01), Hsieh et al.
patent: 6096176 (2000-08-01), Horiike et al.
patent: 6168832 (2001-01-01), Boucher
patent: 6210540 (2001-04-01), Hichwa
patent: 6365010 (2002-04-01), Hollars
patent: 6730197 (2004-05-01), Wang et al.
Geyer Volker
Kaas Patrick
Nguyen Nam
Osman Richard Aron
Scheuten Glasgroep
Van Luan V.
LandOfFree
Device for targeted application of deposition material to a... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Device for targeted application of deposition material to a..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Device for targeted application of deposition material to a... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3808329