Device for suppressing particle splash onto a semiconductor wafe

Details Device for suppressing particle splash onto a semiconductor wafe Device for suppressing particle splash onto a semiconductor wafe

1994-02-14

1995-08-08

Breneman, R. Bruce

Coating apparatus

Work holders, or handling devices

Gripper or clamped work type

118500, 118715, 118728, 118729, 294 16, B05C 1300, C23C 1600

Patent

active

054395232

ABSTRACT:
A device for suppressing the splash of particles onto a semiconductor wafer, such as occurs in association with deposition of epitaxial layers on the wafer, to facilitate maintenance of a clean wafer surface and inhibit the creation of defects, includes a mechanism for deflecting the path of the particles away from the wafer. The mechanism may include nozzles for directing a flow of gas toward the site on the wafer where particle generation occurs, and a vacuum for drawing the particles away from the site.

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patent: 5241758 (1993-09-01), Cruz
patent: 5261960 (1993-11-01), Ozias
patent: 5269847 (1993-12-01), Anderson
patent: 5298720 (1994-03-01), Cuomo

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