Device for sputter deposition of thin layers on flat substrates

Details Device for sputter deposition of thin layers on flat substrates Device for sputter deposition of thin layers on flat substrates

1997-12-11

1999-10-19

Nguyen, Nam

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20429826, 20429808, 20429819, 20429821, 20419212, C23C 1434

Patent

active

059683287

ABSTRACT:
In an apparatus for the sputter deposition of thin electrically insulating layers on substrates (33, 33', . . . ) there is provided in an evacuable chamber which is connected to a treatment gas source, a first pair of tubular magnetron cathodes (5, 5' or 31) and at least one additional pair of magnetron cathodes (6, 6' or 25, 26 or 30, 32), a medium frequency generator (10) connected in series with a transformer (9), where the two secondary winding outputs (11, 12) of said transformer are each connected with the cathodes of a second pair (6, 6' or 25, 26 or 30, 32) and where direct current can be fed into the supply lines for the first cathode pair (31) via a center tap (15) of the transformer (9) and a network (17 or 13, 14).

REFERENCES:
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patent: 5399252 (1995-08-01), Scherer et al.
patent: 5415757 (1995-05-01), Szczyrbowski et al.
patent: 5645699 (1997-07-01), Sieck
patent: 5718815 (1998-02-01), Szczyrbowski et al.
patent: 5814198 (1998-09-01), Lehan et al.

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