Coating apparatus – Projection or spray type – With hood or offtake for waste material
Patent
1996-12-18
1998-07-07
Ozaja, Donald E.
Coating apparatus
Projection or spray type
With hood or offtake for waste material
118 52, 118320, 134902, 1341043, B05B 128, B05B 304, B05C 1102, B08B 304
Patent
active
057762503
ABSTRACT:
A device is for recovering superfluous photoresist material exhausted from a spin coater having a drive motor alternately operated at a high speed and a low speed at predetermined intervals. The device includes a solution collecting member into which superfluous photoresist material and cleaning solution are collected after a photoresist is coated onto a wafer and the wafer is cleaned during operation of the drive motor. The solution collecting member has a groove circumferentially formed therein to allow the superfluous photoresist material to flow therein. First and second discharge pipes communicate with the solution collecting member to drain the superfluous photoresist material and a cleaning solution and a third discharging pipe communicates with the groove formed in the solution collecting member. An actuator is provided to move a blocking member between an open position and closed position to open and close the groove.
REFERENCES:
patent: 5289822 (1994-03-01), Hurtig
Ko Young-Min
Shin Dong-Hwa
Ozaja Donald E.
Padgett Calvin
Samsung Electronics Co,. Ltd.
LandOfFree
Device for recovering photoresist material exhausted from a spin does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Device for recovering photoresist material exhausted from a spin, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Device for recovering photoresist material exhausted from a spin will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1201213