Device for plasma process

Details Device for plasma process Device for plasma process

1990-11-13

1993-12-21

Pascal, Robert J.

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

20429834, 20429835, 20429832, 156345, 156643, H05H 146, C23F 400

Patent

active

052724174

ABSTRACT:
A plasma process device for a generating a plasma in a container under reduced pressure and for processing an object. First and second electrodes are placed in opposed positions in the container. The electrodes are plate-like in shape. A protective member made of a stable material covers the first electrode. A means is provided for mounting the object to be processed on the second electrode. A first high-frequency power source is connected to the first electrode. A second high-frequency power source is connected to the second electrode. A gas supply for introducing desired gas into the container is provided. Frequency of the first high-frequency power source is higher than the frequency of the second high-frequency power source.

REFERENCES:
patent: 4464223 (1984-08-01), Gorin
patent: 4491496 (1985-01-01), Laporte et al.
patent: 5110438 (1992-05-01), Ohmi et al.

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