Device for measuring feeble light and method thereof

Details Device for measuring feeble light and method thereof Device for measuring feeble light and method thereof

1997-02-24

1998-09-15

Epps, Georgia Y.

Optics: measuring and testing

Photometers

Photoelectric

356345, 250214VT, G01J 144

Patent

active

058087338

ABSTRACT:
In a device for measuring feeble light and a method thereof, the device includes a feeble light amplifying device having a reaction chamber with two transparent windows as a constituent part, a detector, and two mirrors. The feeble light generated in the reaction chamber in which an etching process is in progress is amplified by the mirrors and is then detected, whereby an etching endpoint can be accurately determined. Therefore, the damage to semiconductors due to overetching or underetching can be prevented.

REFERENCES:
patent: 5250795 (1993-10-01), Koishi et al.

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