Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Reexamination Certificate
2008-01-29
2008-01-29
Philogene, Haissa (Department: 2821)
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Plasma generating
C315S111010, C315S111210, C250S492200, C250S3960ML, C250S3960ML
Reexamination Certificate
active
07323821
ABSTRACT:
A device generates and/or influences electromagnetic radiation from a plasma, for the lithographic production of semiconductor elements. For example, the device generates and/or reflects EUV-radiation for EUV-lithography. In a first example, a magnetic means (10) generates at least one inhomogeneous magnetic field (11) and is provided as means for the targeted screening of at least one surface of the device (1; 5; 12) and/or another component (5; 12) from the charge carriers in the plasma (3).
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Schwarzl Siegfried
Wurm Stefan
Le Tung X
Philogene Haissa
Qimonda AG
Slater & Matsil L.L.P.
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