Device for generating and/or influencing electromagnetic...

Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating

Reexamination Certificate

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C315S111010, C315S111210, C250S492200, C250S3960ML, C250S3960ML

Reexamination Certificate

active

07323821

ABSTRACT:
A device generates and/or influences electromagnetic radiation from a plasma, for the lithographic production of semiconductor elements. For example, the device generates and/or reflects EUV-radiation for EUV-lithography. In a first example, a magnetic means (10) generates at least one inhomogeneous magnetic field (11) and is provided as means for the targeted screening of at least one surface of the device (1; 5; 12) and/or another component (5; 12) from the charge carriers in the plasma (3).

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