Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate
2007-01-09
2007-01-09
Lund, Jeffrie R. (Department: 1763)
Coating apparatus
Gas or vapor deposition
With treating means
C118S715000, C204S298120, C156S345340, C156S345470
Reexamination Certificate
active
10874535
ABSTRACT:
A plasma processing system includes a reactor, a top electrode made of a magnetic or ferromagnetic metal or a metal-alloy, wherein a RF or DC power is applied to generate plasma within the reactor; a gas showerhead fixed to the top electrode; a sheet-like magnetic assembly bound to the upper surface of the gas showerhead, which includes a plurality of separate magnets, a metal sheet made of a ferromagnetic metal, and a deformable film.
REFERENCES:
patent: 6432261 (2002-08-01), Watanabe et al.
patent: 2001/0008173 (2001-07-01), Watanabe et al.
patent: 2005/0028935 (2005-02-01), Wickramanayaka et al.
patent: 07-335635 (1995-12-01), None
patent: 2001-267295 (2001-09-01), None
patent: 2001-267297 (2001-09-01), None
Doi Hiroshi
Ishihara Masahito
Nozaki Yoshikazu
Wickramanayaka Sunil
Anelva Corporation
Lund Jeffrie R.
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