Device for cryogenically fabricating source material for plasma

Details Device for cryogenically fabricating source material for plasma Device for cryogenically fabricating source material for plasma

1983-06-03

1985-04-02

Morgenstern, Norman

Coating apparatus

Gas or vapor deposition

With treating means

118728, 118733, 118 50, C23C 1308

Patent

active

045080550

ABSTRACT:
A device for fabricating a target of a lasing material and a pump material or lasing at X-ray wavelengths wherein one of the materials occurs naturally as a gas. A substrate of the other material is cooled below the freezing point of the one material occuring naturally as a gas. Then a gaseous atmosphere of the latter material is supplied to the cooled substrate so that a frozen layer of the latter material condenses onto the substrate to form the target.

REFERENCES:
patent: 3914446 (1975-10-01), Ohkuma
patent: 4121430 (1978-10-01), Bachler et al.
patent: 4221186 (1980-09-01), Woerner

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