Device for coating a substrate by means of plasma-CVD or cathode

Details Device for coating a substrate by means of plasma-CVD or cathode Device for coating a substrate by means of plasma-CVD or cathode

1985-01-25

1987-06-16

Bueker, Richard

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

118723, 118738, B05D 306

Patent

active

046735887

ABSTRACT:
A device for covering a substrate by means of both plasma chemical vapor deposition and by high-frequency cathode sputtering which, as a result of easily exchangeable individual devices to introduce gaseous substances into the reaction space as well as easily exchangeable individual devices for influencing the flow of the process gases within the reaction space, results in a very good uniformity of the layer thickness of the produced layers even when the operation has to be carried out at higher gas pressures and hence higher flow rates.

REFERENCES:
patent: 3696779 (1972-10-01), Murai et al.
patent: 4142004 (1979-02-01), Hauser, Jr. et al.
patent: 4399016 (1983-08-01), Tsukada et al.
patent: 4461237 (1984-07-01), Hinkel et al.
patent: 4478875 (1984-10-01), Pachonik et al.
patent: 4512283 (1985-04-01), Bonifield et al.
patent: 4513021 (1985-04-01), Purdes et al.

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