Device for coating a substrate by means of plasma-CVD or cathode

Details Device for coating a substrate by means of plasma-CVD or cathode Device for coating a substrate by means of plasma-CVD or cathode

1987-02-27

1987-12-29

Bueker, Richard

Coating apparatus

Gas or vapor deposition

With treating means

118730, 118 501, 204298, C23C 1600

Patent

active

047153199

ABSTRACT:
A device for covering a substrate by means of both plasma chemical vapor deposition and by high-frequency cathode sputtering which, as a result of easily exchangeable individual devices to introduce gaseous substances into the reaction space as well as easily exchangeable individual devices for influencing the flow of the process gases within the reaction space, results in a very good uniformity of the layer thickness of the produced layers even when the operation has to be carried out at higher gas pressures and hence higher flow rates.

REFERENCES:
patent: 3696779 (1972-10-01), Murai
patent: 4142004 (1979-02-01), Hauser
patent: 4399016 (1983-08-01), Tsukada
patent: 4461237 (1984-07-01), Hinkel
patent: 4478875 (1984-10-01), Pachonik
patent: 4512283 (1985-04-01), Bonifield
patent: 4513021 (1985-04-01), Purdes

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