Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1990-04-17
1991-11-26
Weisstuch, Aaron
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20429807, C23C 1434
Patent
active
050680218
ABSTRACT:
In a process for coating a plastic substrate 1 made of polymethylmethacrylate with metal using a direct current source 10 connected to an electrode disposed in an evacuable coating chamber 15, 15a and electrically connected to a target 3 to be sputtered, the adhesiveness and the service life of the layer are improved. In a first coating step, an argon plasma is maintained in the coating chamber 15, 15a for an extremely short period of time preferably until the so generated sputtering process passes from the oxidic to the metallic process. In a second coating step, helium is introduced in the coating chamber 15, 15a and a helium plasma is ignited. In a third coating step, argon is introduced into the coating chamber 15, 15a and an argon plasma is ignited and this argon plasma process is maintained until a desired thickness is reached.
REFERENCES:
patent: 4816124 (1989-03-01), Manabe et al.
patent: 4961832 (1990-10-01), Shagun et al.
Fritsche Wolf-Eckart
Schlussler Jim
Sichmann Eggo
Leybold Aktiengesellschaft
Weisstuch Aaron
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