Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Reexamination Certificate
2007-02-27
2007-02-27
McDonald, Rodney G. (Department: 1753)
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
C204S298060, C204S298140, C204S298160, C118S7230AN, C118S7230MP, C118S7230ER, C156S345430, C156S345460, C427S569000, C427S571000
Reexamination Certificate
active
10344666
ABSTRACT:
A device (1) for amplifying the current of an abnormal electrical discharge, characterized in that it comprises an electrode which is positively polarized (2) and associated with a magnetic circuit (3) producing a magnetic field (4) which is uniformly divergent, whereby the intensity on the surface of the electrode is more than approximately 6.102Tesla, the electrode being positioned in the region where the magnetic field is at its most intense.
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patent: 2 534 276 (1984-04-01), None
Kay, “Magnetic Field Effects on an Abnormal Truncated Glow Discharge and Their Relation to Sputtered Thin-Film Growth”, Journal of Applied Physics, vol. 34, No. 4, Apr. 1963, pp. 760-768.
Window B et al:, “Unbalanced DC Magnetrons as Sources of High Ion Fluxes”, Journal of Vacuum Science and Technology: Part A, American Institute of Physics. New York, US, vol. 4, No. 3, Part 1, May 1, 1986, pp. 453-456, XP000650364, ISSN: 0734-2101, cited in the application the whole document.
Patent Abstracts of Japan, vol. 012, No. 301 (C-521), Aug. 16, 1988 & JP 63 072870 A (Hitachi Ltd), Apr. 2, 1988 abstract.
Heau Christophe
Terrat Jean-Paul
McDonald Rodney G.
Tecmachine
Young & Thompson
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