Device fabrication entailing synchrotron radiation

Details Device fabrication entailing synchrotron radiation Device fabrication entailing synchrotron radiation

1993-05-10

1995-08-08

Duda, Kathleen

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430966, 430967, 2504921, 2504922, 378 34, 378 35, G03C 516, G21K 500

Patent

active

054397812

ABSTRACT:
Devices built to design rules .ltoreq.0.25 .mu.m are pattern delineated by use of synchrotron-emitted x-ray radiation using a condenser which collects over a collection arc of at least 100 mrad. Condenser designs provide for processing of collected radiation to tailor characteristics such as direction and divergence. Pattern delineation by proximity printing as well as by projection printing is described. Forms of projection printing include reduction ringfield projection as by 5:1 mask:image reduction.

REFERENCES:
patent: 5175755 (1992-12-01), Kumakhov
patent: 5235626 (1993-08-01), Flamholz
patent: 5263073 (1993-11-01), Feldman
R. P. Haelbich, et al., "Synchrotron Radiation X-Ray Lithography", Nuc. Inst. & Methods, 222, pp. 291-301 (1984).
R. Lopez-Delgado, et al., "Focusing all the synchrotron radiation(2.pi.radians) from an electron storage ring on a single point without time distortion", Optics Communications, vol. 19, No. 2, pp. 286-291 (1976).

Affiliated with

Also associated with

Rating

Device fabrication entailing synchrotron radiation does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Device fabrication entailing synchrotron radiation, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Device fabrication entailing synchrotron radiation will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-970427