Device fabrication entailing plasma-derived x-ray delineation

Details Device fabrication entailing plasma-derived x-ray delineation Device fabrication entailing plasma-derived x-ray delineation

1993-05-20

1994-08-16

Porta, David P.

X-ray or gamma ray systems or devices

Specific application

Lithography

378 43, 378 85, G21K 500

Patent

active

053393465

ABSTRACT:
Submicron device fabrication entailing ringfield x-ray pattern delineation is facilitated by use of a condenser including a faceted collector lens. The collector lens is constituted of paired facets, symmetrically placed about an axis of a laser-pumped plasma source. Each of the members of a pair produce an image of the entire illumination field so that inhomogeneities in illumination intensity are compensated within each composite image as produced by a particular pair.

REFERENCES:
patent: 4650315 (1987-03-01), Markle
patent: 4711535 (1987-12-01), Shafer
patent: 4734829 (1988-03-01), Wu et al.
patent: 5063586 (1991-11-01), Jewell et al.
W. T. Silfvast, et al., "Laser-Produced plasmas for soft x-ray projection lithography", J. Vac. Sci. Tech. B 106, Nov./Dec. 1992, pp. 3126-3133.

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