Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1987-05-01
1989-09-19
Dees, Jose G.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
430966, 430967, 430 5, 428698, 428699, 428704, 378 35, 378 34, 427160, 4273722, G03F 900, G21K 500
Patent
active
048680931
ABSTRACT:
A hydrogen-free boron-containing membrane in tension exhibits advantageous properties for use as a mask in X-ray lithography.
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Journal Vacuum Science Technology B, vol. 5(1), Jan./Feb. 1987, "Radiation Damage Effects in Boron Nitride Mask Membranes Subjected to X-Ray Exposures" by W. A. Johnson et al., pp. 257-261.
American Telephone and Telegraph Company AT&T Bell Laboratories
Caplan David I.
Dees Jos,e G.
Loney Donald J.
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