Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Reexamination Certificate
2006-06-13
2006-06-13
Berman, Jack I. (Department: 2881)
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
C250S492100, C250S306000, C250S307000, C378S034000, C134S001000, C134S021000, C134S031000, C134S039000
Reexamination Certificate
active
07060993
ABSTRACT:
The invention relates to a method for preventing contamination on the surfaces of optical elements comprising a multi-layer system, during the exposure thereof to radiation at signal wave lengths in an evacuated closed system comprising a residual gas atmosphere, whereby the photocurrent generated by means of photo emission from the radiated surface of the multi-layer system is measured. The photocurrent is used to regulate the gas composition of the residual gas. The gas composition is altered according to at least one lower and one upper threshold value of the photocurrent. The invention also relates to a device for regulating the contamination on the surface of at least one optical element during exposure and an EUV-lithographic device and a method for cleaning the surfaces of the optical elements contaminated by carbon.
REFERENCES:
patent: 4998019 (1991-03-01), Stokowski et al.
patent: 5393980 (1995-02-01), Yost et al.
patent: 6004180 (1999-12-01), Knall et al.
patent: 6533952 (2003-03-01), Klebanoff et al.
patent: 6545272 (2003-04-01), Kondo
patent: 6847463 (2005-01-01), Malinowski
patent: 2001/0026354 (2001-10-01), Aoki
patent: 2004/0211448 (2004-10-01), Klebanoff et al.
patent: 41 06 841 (1992-09-01), None
patent: 0 987 601 (2000-03-01), None
patent: 62051224 (1987-03-01), None
patent: 2000 346817 (2000-12-01), None
“Soft X-Ray and EUV Imaging Systems II”, Daniel A. Tichenor, James A. Folta,Proceedings of The International Society of Optical Engineering, Jul. 31-Aug. 1, 2001, San Diego, USA, vol. 4506, pp. 93-104.
Samal, E.; Becker, W.: “An Outline of Practical Control Engineering” (Grundriss der praktischen Regelungstechnik, Oldenbourg Verlag), pp. 306-307 (1993). (with translation).
Klein Roman
Mertens Bas M.
Stietz Frank
Wedowski Marco E.
Berman Jack I.
Carl Zeiss SMT AG
Hudak, Shunk & Farine Co. LPA
LandOfFree
Device, EUV-lithographic device and method for preventing... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Device, EUV-lithographic device and method for preventing..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Device, EUV-lithographic device and method for preventing... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3668614