Device comprising a field of tips used in biotechnology...

Details Device comprising a field of tips used in biotechnology... Device comprising a field of tips used in biotechnology...

2011-03-29

2011-03-29

Pert, Evan (Department: 2893)

Semiconductor device manufacturing: process

Chemical etching

Vapor phase etching

C438S911000, C445S050000, C257SE21404

Reexamination Certificate

active

07915176

ABSTRACT:
A method for manufacturing a device including a field of micrometric tips, including forming a polycrystalline layer on a support; performing an anisotropic plasma etching of all or part of the polycrystalline layer by using a gas mixture including chlorine and helium, whereby tips are formed at the surface of the polycrystalline layer.

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Branston et al. “Field Emission from Metal-Coated Silicon Tips,” IEEE Transactions on Electron Devices, vol. 38,2329, 1991.
Flamm et al. “The Design of Plasma Etchants,” Plasma Chemistry and Plasma Processing, vol. 1,317, 1981.

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