Device and method for plasma processing, and slow-wave plate

Details Device and method for plasma processing, and slow-wave plate Device and method for plasma processing, and slow-wave plate

2006-08-01

2006-08-01

Alejandro-Mulero, Luz (Department: 1763)

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

C118S7230MW

Reexamination Certificate

active

07083701

ABSTRACT:
In a microwave plasma processing apparatus that uses a radial line slot antenna, a slot plate (16) is formed by a material having a thermal expansion rate close to the wave retardation plate (18), or depositing a metal on a dielectric plate constituting the wave retardation plate (18). An intimate contact between the wave retardation plate and a slot plate constituting a microwave radiation surface is improved so as to prevent an abnormal electric discharge.

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