Static information storage and retrieval – Read/write circuit – Testing
Reexamination Certificate
2001-10-15
2002-08-27
Mai, Son (Department: 2818)
Static information storage and retrieval
Read/write circuit
Testing
C365S202000, C365S203000
Reexamination Certificate
active
06442086
ABSTRACT:
BACKGROUND OF THE INVENTION
1. Field of the Invention
This invention relates in general to semiconductor memories and, more specifically, to devices and methods for margin testing a semiconductor memory by, for example, equilibrating all complementary and true digit lines of the memory to ground simultaneously during a test mode.
2. State of the Art
As shown in 
FIG. 1
, one conventional method for margin testing a sub-array 
10
 of a semiconductor memory begins with storing a supply voltage V
CC 
on all memory cell capacitors 
12
 of the sub-array 
10
. This is accomplished by writing logical “1” bits to memory cells attached to true digit lines D
0
, D
1
, etc. using sense amplifiers 
14
 and even row lines R
0
, R
2
, etc., and by writing logical “0” bits to memory cells attached to complementary digit lines D
0
*, D
1
*, etc. using the sense amplifiers 
14
 and odd row lines R
1
, R
3
, etc. A cell plate voltage DVC
2
 equal to one-half the supply voltage V
CC 
is applied to the cell plate of each memory cell capacitor 
12
.
Once each memory cell capacitor 
12
 has stored the supply voltage V
CC
, the row line R
0
, for example, is fired, causing the memory cells attached to the row line R
0
 to dump their stored charge from their memory cell capacitors 
12
 onto the true digit lines D
0
, D
1
, etc. This causes the sense amplifiers 
14
 to pull each of the true digit lines D
0
, D
1
, etc. up to the supply voltage V
CC
, and to pull each of the complementary digit lines D
0
*, D
1
*, etc. down to ground. As a result, a full V
CC
-to-ground voltage drop is imposed across NMOS access devices 
16
 of the memory cells attached to the complementary digit lines D
0
*, D
1
*, etc. The V
CC
-to-ground voltage drop is maintained across the NMOS access devices 
16
 for a predetermined refresh interval of typically about 150 to 200 milliseconds (ms). This stresses any “leaky” NMOS access devices 
16
 and causes any such NMOS access devices 
16
 to lose significant charge from their memory cell capacitors 
12
 to the complementary digit lines D
0
*, D
1
*, etc. to which they are attached.
Once the predetermined refresh interval is over, all of the memory cells attached to the complementary digit lines D
0
*, D
1
*, etc. are read. Any of these cells that read out a logical “1” bit as a result of leaking excessive charge, instead of reading out the logical “0” bit they originally stored, are flagged as failing the margin test.
Once the memory cells attached to the complementary digit lines D
0
*, D
1
*, etc. have been tested, the memory cells attached to the true digit lines D
0
, D
1
, etc. are tested by firing the row line R
1
, for example. This causes the memory cells attached to the row line R
1
 to dump their stored charge from their memory cell capacitors 
12
 onto the complementary digit lines D
0
*, D
1
*, etc. In turn, this causes the sense amplifiers 
14
 to pull each of the complementary digit lines D
0
*, D
1
*, etc. up to the supply voltage V
CC
, and to pull each of the true digit lines D
0
, D
1
, etc. down to ground. As a result, a full V
CC
-to-ground voltage drop is imposed across NMOS access devices 
18
 of the memory cells attached to the true digit lines D
0
, D
1
, etc. The V
CC
-to-ground voltage drop is maintained across the NMOS access devices 
18
 for another predetermined refresh interval of about 150 to 200 ms. This stresses any “leaky” NMOS access devices 
18
 and causes any such NMOS access devices 
18
 to lose significant charge from their memory cell capacitors 
12
 to the true digit lines D
0
, D 
1
, etc. to which they are attached.
Once the predetermined refresh interval is over, all of the memory cells attached to the true digit lines D
0
, D
1
, etc. are read. Any of these cells that read out a logical “0” bit as a result of leaking excessive charge, instead of reading out the logical “1” bit they originally stored, are flagged as failing the margin test.
This conventional margin testing method thus typically takes two predetermined refresh intervals of about 150 to 200 ms. each to complete. Since row lines in different sub-arrays in a semiconductor memory typically cannot be fired simultaneously because the addressing of the row lines is local to their respective sub-arrays, this conventional method cannot be used on more than one sub-array at a time. As a result, in a semiconductor memory containing four sub-arrays, for example, the conventional method described above takes approximately 1.2 to 1.6 seconds to complete. Because of the large number of semiconductor memories that typically require margin testing during production, it would be desirable to find a margin testing method that can be completed more quickly than the method described above.
As shown in 
FIG. 2
, another conventional method for margin testing a semiconductor memory has been devised to conduct margin tests more quickly than the method described above. In this method, a sense amplifier 
20
 includes equilibrating NMOS transistors 
22
 which equilibrate true and complementary digit line pairs D
0
, D
0
*, etc. to a bias voltage V
BIAS 
on an equilibrate bias node 
23
 in response to an equilibrate signal EQ. It should be understood that an “equilibrate bias node” is a node to which a cell plate is coupled, and from which a bias voltage is globally distributed for use by equilibrating transistors throughout a semiconductor memory.
When the semiconductor memory is not in a margin test mode, a test mode signal TESTMODE is inactive, so that a PMOS transistor 
24
 is on and the bias voltage V
BIAS 
on the equilibrate bias node 
23
 is equal to the cell plate voltage DVC
2
 on the cell plate 
25
. When the semiconductor memory is in a margin test mode, the test mode signal TESTMODE is active so that the PMOS transistor 
24
 isolates the equilibrate bias node 
23
 from the cell plate 
25
, and so an NMOS transistor 
26
 connects the equilibrate bias node 
23
 to a probe pad 
28
 positioned on the exterior of the semiconductor memory. A stressing voltage, such as ground, can then be applied to the probe pad 
28
 during margin testing to simultaneously stress memory cells attached to both the true and complementary digit lines D
0
, D
0
*, etc.
Because the method described immediately above does not require the firing of any row lines in order to stress memory cells, all cells in a semiconductor memory can be stressed at once using this method. As a result, this method only requires one predetermined refresh period to complete testing, no matter how many sub-arrays a semiconductor memory contains. Thus, the method dramatically improves the speed with which margin testing can be completed.
Unfortunately, the method described above with respect to 
FIG. 2
 has proven difficult to implement because the PMOS transistor 
24
 generally does not reliably isolate the equilibrate bias node 
23
 from the cell plate 
25
. In addition, the probe pad 
28
 has proven to be a cumbersome addition to the exterior of a semiconductor memory.
Therefore, there is a need in the art for a device and method for margin testing a semiconductor memory that avoid the problems associated with the probe pad method described above while still providing a rapid margin testing device and method.
SUMMARY OF THE INVENTION
Circuitry, in accordance with the invention for margin testing a semiconductor memory, such as a Dynamic Random Access Memory (DRAM), includes switching circuits formed within the memory. Each switching circuit can be conveniently incorporated into a sense amplifier of the memory, and each is associated with a pair of digit lines of the memory to which it selectively applies a stressing voltage at substantially the same time during a margin test mode of the memory. The stressing voltage can be ground when all the memory cells of the memory store a supply voltage level during the margin test, or it can be at the supply voltage level when all the memory cells store a ground voltage level during the margin test. The switching circuits can apply the stressing voltage to the digit line pairs through equili
Mai Son
Micro)n Technology, Inc.
TraskBritt
LandOfFree
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