Device and method for determining an illumination intensity...

Details Device and method for determining an illumination intensity... Device and method for determining an illumination intensity...

2006-04-11

2006-04-11

Tokar, Michael (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

Reexamination Certificate

active

07027130

ABSTRACT:
A system and method for generating an illumination intensity profile of an illuminator that forms part of a projection lithography system. Radiation from the illuminator is projected towards an illumination profile mask having a plurality of apertures such that each aperture passes a distinct portion of the radiation. The intensity of each of the distinct portions of radiation is detected and assembled to form the illumination intensity profile.

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Brunner, T.A., Impact of Lens Aberrations on Optical Lithography. vol. 41, No. 1/2, Optical Lithography [online] 1997 [retrieved Nov. 24, 2003]. Retrieved from the Internet: URL: http://www.research.ibm.com/journal/rd/411/brunner.html.

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