Device addressing gas contamination in a wet process

Details Device addressing gas contamination in a wet process Device addressing gas contamination in a wet process

2005-03-15

2005-03-15

Barr, Michael (Department: 1746)

Cleaning and liquid contact with solids

Apparatus

Movably mounted fluid-holding receptacles

C134S155000, C134S186000, C134S902000

Reexamination Certificate

active

06866049

ABSTRACT:
A device for wet processing of a semiconductor-containing substrate that addresses contamination in the wet process by removing undesired sources of gas contamination, the method involving pumping a processing liquid through a degasifier, exposing the semiconductor wafer, in a vessel, to the degasified processing liquid; and optionally recirculating the processing liquid through the degasifier and back into the vessel.

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CFM Technologies, printout of internet web site (http://www.cfmtech.com/tech.html) (Nov. 20, 1998).
Yasuyuki Yagi, et al., Advanced Ultrapure Water Systems with Low Dissolved Oxygen for Native Oxide Free Wafer Processing, IEEE Transactions on Semiconductor Mfg., May 1992, vol. 5, No. 2 at 121-127.

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