Development system for manufacturing semiconductor devices, incl

Details Development system for manufacturing semiconductor devices, incl Development system for manufacturing semiconductor devices, incl

1998-12-07

2000-03-07

Mathews, Alan A.

Photography

Fluid-treating apparatus

Fluid application to one side only of photographic medium

396612, 396627, 118 52, 134902, G03D 500

Patent

active

060331356

ABSTRACT:
A development system for manufacturing semiconductor devices uses a container to easily remove by-products of development from a wafer by: soaking the wafer in the developer with the pattern face downward; spraying rinse onto the pattern face from below; rotating the wafer at high speed to remove the rinse and by-products; and then cleaning and ventilating the container so that the developer, rinse, cleaning solution and development by-products are removed from the container. No by-products are left in the comers of the pattern of the pattern face, because the development and rinse are performed with the pattern facing downward. No by-products, developer, rinse or cleaning solution contaminate the wafer, because steps of the process are performed in an enclosed container which is cleaned and ventilated between development of each wafer.

REFERENCES:
patent: 4590094 (1986-05-01), Ringer
patent: 4851263 (1989-07-01), Ishii et al.
patent: 5650196 (1997-07-01), Muhlfriedel et al.
patent: 5930549 (1999-07-01), Kim et al.

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