Development of radiation sensitive compositions

Details Development of radiation sensitive compositions Development of radiation sensitive compositions

1999-12-03

2000-11-14

Le, Hoa Van

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Finishing or perfecting composition or product

510176, G03F 732

Patent

active

061468169

ABSTRACT:
Developer liquids for negative working radiation sensitive compositions are provided, the developers including an alkyl ester of a hydroxy carboxylic acid, preferably the n-butyl ester of glycolic acid. The developer liquids have a pH in the range of from 7.0 to 9.5 and preferably also comprise an alkaline material, an anionic surfactant, a hydrotrope or solubilising agent and an etching agent and optionally include sequestering agents, buffering agents biocides and the like. The developer liquids are biodegradable and do not persist in the environment, thereby facilitating the avoidance of effluent and disposal problems and associated health, safety and environmental concerns. A method for the development of an imagewise exposed, negative working photosensitive composition is also provided, with particular reference to precursors for lithographic printing plates.

REFERENCES:
patent: 5466559 (1995-11-01), Miller et al.

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