Development of germanium selenide photoresist

Details Development of germanium selenide photoresist Development of germanium selenide photoresist

1982-02-05

1983-01-11

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156643, 156646, 1566591, 156904, 204192E, 427 431, 430313, 430317, 430434, H01L 21306, B44C 122, C03C 1500, C03C 2506

Patent

active

043680992

ABSTRACT:
An improved method of etching a silver-doped germanium selenide resist film utilizing as the etchant gas sulfur hexafluoride.

REFERENCES:
patent: 3707372 (1972-12-01), Hallman et al.
patent: 4127414 (1978-11-01), Yoshikawa et al.
patent: 4276368 (1981-06-01), Heller et al.
patent: 4320191 (1982-03-01), Yoshikawa et al.
patent: 4330384 (1982-05-01), Okudaira et al.
Applied Physics Letters, vol. 29, No. 10, pp. 677-679, 1976 (Yoshikawa et al. II).
Applied Physics Letters, vol. 36, No. 1, pp. 107-109, 1980 (Yoshikawa et al. I).
J. Vac Sci. Technol., vol. 16, No. 6, pp. 1977-1979, 1979 (Tai et al. I).
J. Vac Sci. Technol., vol. 17, No. 5, pp. 1169-1176, 1980 (Tai et al. II).

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