Development monitoring apparatus and method adopting the same

Details Development monitoring apparatus and method adopting the same Development monitoring apparatus and method adopting the same

1996-11-12

1998-12-08

Rutledge, D.

Photography

Fluid-treating apparatus

Photographic medium or cartridge sensing

396611, 1566261, G03D 1300

Patent

active

058483152

ABSTRACT:
A development monitoring apparatus in which a non-exposed wafer is easily reworked by monitoring a developed portion and an undeveloped portion of a photoresist film on a wafer. The apparatus includes a light source for outputting incident light to a wafer having a photoresist film coated with a developer, and a light collector for collecting reflected light reflecting from the wafer. A filter transmits only the reflected light having a desired wavelength. A photoelectric device transforms the reflected light which passes through the filter into an electrical signal. Correct development of the photoresist film is determined by measuring the intensity change of the electrical signal over time. Accordingly, an exposed wafer and an non-exposed wafer are rapidly reworked, so that an increase in manufacturing costs and deterioration of yield rate can be prevented.

REFERENCES:
patent: 4136940 (1979-01-01), Lin
patent: 4569717 (1986-02-01), Ohgami et al.
patent: 5190614 (1993-03-01), Leach et al.
patent: 5271796 (1993-12-01), Miyashita et al.
patent: 5272116 (1993-12-01), Hosono
patent: 5413941 (1995-05-01), Koos et al.
patent: 5516608 (1996-05-01), Hobbs et al.
patent: 5591300 (1997-01-01), Schiller

Affiliated with

Also associated with

Rating

Development monitoring apparatus and method adopting the same does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Development monitoring apparatus and method adopting the same, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Development monitoring apparatus and method adopting the same will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-189692