Developing solution for positive-working photoresist comprising

Details Developing solution for positive-working photoresist comprising Developing solution for positive-working photoresist comprising

1988-09-19

1989-05-23

Michl, Paul R.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Finishing or perfecting composition or product

430309, 430323, 430325, G03C 518, G03C 524

Patent

active

048330671

ABSTRACT:
The aqueous developing solution of the invention for positive-working photoresist compositions contains, in addition to an organic basic compound free from metallic ions, such as tetramethyl ammonium hydroxide and choline, as the principal ingredient, from 50 to 5000 ppm of an acetylene alcohol. In comparison with conventional developing solutions, the inventive developing solution is advantageous in the uniformity of the patterned photoresist layer, higher sensitivity and smaller temperature dependency of development and less drawbacks due to foaming of the solution.

REFERENCES:
patent: 4239661 (1980-12-01), Muraoka
patent: 4374920 (1983-02-01), Wanat et al.
patent: 4603058 (1986-07-01), Adams
patent: 4610953 (1986-09-01), Hashimoto et al.
patent: 4613561 (1986-09-01), Lewis

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