Developing solution for negative type photosensitive resin compo

Details Developing solution for negative type photosensitive resin compo Developing solution for negative type photosensitive resin compo

1991-05-29

1998-05-26

Dote, Janis L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Finishing or perfecting composition or product

430325, 430309, G03F 732

Patent

active

057562679

ABSTRACT:
A developing solution for negative type photo-sensitive resin compositions which comprises an aqueous solution containing 0.01 to 1.5% by weight of at least one compound selected from quaternary ammonium bases represented by formula (I): ##STR1## wherein R.sup.1, R.sup.2, R.sup.3 and R.sup.4 are the same or different, and are groups selected from the class consisting of alkyl and hydroxyalkyl groups, each group having 1 to 6 carbon atoms, and containing a nonionic, cationic or amphoteric surface active agent. The developing solution allows for development of sharp image patterns within a short period without forming mottles.

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