Developing solution feed system for semiconductor photolithograp

Details Developing solution feed system for semiconductor photolithograp Developing solution feed system for semiconductor photolithograp

1997-09-12

1998-11-24

Mathews, A. A.

Photography

Fluid-treating apparatus

Fluid application to one side only of photographic medium

396565, 396627, 134 84, 134110, 134902, G03D 504, B08B 304

Patent

active

058420754

ABSTRACT:
A developing solution feed system for a semiconductor photolithography process feeds the developing solution while removing any gas contained in the solution at a high solution feed pressure. The developing solution feed system has a plurality of feed tanks and a developing solution feed line having a plurality of first connecting pipes, each connected to the feed tanks, a second connecting pipe connected to the first connecting pipe to be converged into one passage, and a plurality of third connecting pipes branching out from the second connecting pipe. The system also contains nozzles connected to the third connecting pipes to thereby sputter the developing solution onto wafers each located in process chambers, a gas removal device installed in the one passage of the second connecting pipe to thereby remove gas contained in the developing solution, and shut off valves, each installed in the third connecting pipes to thereby open and close passages, so that the developing solution can selectively be fed into only one process chamber at a time through the third connecting pipes.

REFERENCES:
patent: 5301701 (1994-04-01), Nafziger
patent: 5542441 (1996-08-01), Mohindra et al.
patent: 5678116 (1997-10-01), Sugimoto et al.
patent: 5722442 (1998-03-01), Hoffman et al.

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