Developing photoresist with supercritical fluid and developer

Details Developing photoresist with supercritical fluid and developer Developing photoresist with supercritical fluid and developer

2005-08-02

2005-08-02

Le, Hoa Van (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

C430S322000

Reexamination Certificate

active

06924086

ABSTRACT:
A method of developing a polymeric film without the need for a water rinse step. An object having a surface supporting a polymeric film is placed onto a support region within a pressure chamber. A fluid and developer is introduced into the pressure chamber and the object is processed at supercritical conditions to develop the polymeric film such that the polymeric film is not substantially deformed. The pressure chamber is then vented.

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