Developing method, substrate treating method, and substrate...

Details Developing method, substrate treating method, and substrate... Developing method, substrate treating method, and substrate...

2006-08-22

2006-08-22

Le, Hoa Van (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Processing feature prior to imaging

C430S311000, C430S319000

Reexamination Certificate

active

07094522

ABSTRACT:
A developing method comprises determining in advance the relation of resist dissolution concentration in a developing solution and resist dissolution speed by the developing solution, estimating in advance the resist dissolution concentration where the resist dissolution speed is a desired speed or more from the relation, and developing in a state in which the resist dissolution concentration in the developing solution is the estimated dissolution concentration or less.

REFERENCES:
patent: 6550990 (2003-04-01), Sakurai et al.
patent: 2002/0121341 (2002-09-01), Tanaka et al.
patent: 2002-252167 (2002-09-01), None
patent: 2003-7581 (2003-01-01), None
patent: 2003-234286 (2003-08-01), None
Notification of Reasons for Rejection Issued by Japanese Patent Office mailed, Apr. 25, 2006, in Japanese Application No. 2002-252503 and English translation of Notice.

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