Developing method and developing unit

Details Developing method and developing unit Developing method and developing unit

2008-09-23

2008-09-23

Mathews, Alan A (Department: 2851)

Photography

Fluid-treating apparatus

Fluid application to one side only of photographic medium

C134S001300, C134S902000, C438S745000

Reexamination Certificate

active

11898693

ABSTRACT:
In a developing method for performing developing treatment of a substrate by supplying a developing solution onto a resist film formed on a surface of the substrate, the present invention controls a zeta potential of the surface of the substrate at a predetermined potential in the same polarity as that of a zeta potential of insoluble substances floating in the developing solution, thereby preventing or reducing the adhesion of the insoluble substances to the resist film and the substrate. This remedies the occurrence of development defects. The adhesion of the insoluble substances to the resist film and the substrate can also be prevented or inhibited by supplying an acid liquid to a liquid on the substrate, or controlling a pH value of the liquid on the substrate to control an absolute value of the zeta potential of the insoluble substances.

REFERENCES:
patent: 4755844 (1988-07-01), Tsuchiya et al.
patent: 5575706 (1996-11-01), Tsai et al.
patent: 6191040 (2001-02-01), Glass
patent: 6277203 (2001-08-01), Jiang et al.
patent: 6488038 (2002-12-01), Bergman
patent: 2002/0170572 (2002-11-01), Tomita et al.
patent: 63-172269 (1988-07-01), None
patent: 06-186754 (1994-07-01), None
patent: 06-267838 (1994-09-01), None
patent: 06-282080 (1994-10-01), None
patent: 07-120935 (1995-05-01), None
patent: 07-142342 (1995-06-01), None
patent: 08-055776 (1996-02-01), None
patent: 08-083745 (1996-03-01), None
patent: 08-102456 (1996-04-01), None
patent: 08-167551 (1996-06-01), None
patent: 09-134899 (1997-05-01), None
patent: 11-288105 (1999-10-01), None
patent: 11-295902 (1999-10-01), None
patent: 2001-070898 (2001-03-01), None
patent: 2001-077006 (2001-03-01), None
patent: 2001-215734 (2001-08-01), None
JPO Office Action-Notification of Reason for Refusal (4 pages) with English translation (2 pages), App. No. 2003-053152, Dispatch No. 456814, Dispatch Date: Sep. 18, 2007.
JPO Office Action-Notification for Reason for Refusal (3 pages) with English translation (2 pages), App. No. 2003-053152, Dispatch No. 638648, Dispatch Date: Dec. 18, 2007.
Notification of Reason for Refusal, Japanese Patent Application No. 2003-053101, Dispatch No. 136002, Dispatch Date: Apr. 11, 2006.
Japanese Notification of Reason for Refusal w/English translation, DN163865, May 17, 2005.

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