Developing method and developing apparatus for optical record me

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making named article

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430331, 430326, 430421, G11B 726

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057597499

ABSTRACT:
A photo-resist layer of positive type, which is formed by a predetermined thickness on a disc substrate and which is exposed by a light beam modulated in accordance with record information to produce an optical record medium comprising the photo-resist layer and the disc substrate, is developed by the developing method. The developing method includes the steps of: firstly developing the exposed photo-resist layer by alkaline developing solution which has a normality of 0.17 to 0.19N for a first time period such that the photo-resist layer be incompletely developed to a predetermined depth from a surface of the exposed photo-resist layer; firstly washing the firstly developed photo-resist layer to stop the firstly developing step, and firstly drying the firstly washed photo-resist layer; secondly developing the firstly dried photo-resist layer by the alkaline developing solution for a second time period which is longer than the first time period such that the photo-resist layer be completely developed to a pit depth; and secondly washing the secondly developed photo-resist layer to stop the secondly developing step, and drying the secondly washed photo-resist layer to produce the optical record medium recorded with the record information as a developed pit pattern.

REFERENCES:
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patent: 4613561 (1986-09-01), Lewis
patent: 4822722 (1989-04-01), Lewis et al.
Elliot, David J., Integrated Cicuit Fabrication Technology McGraw-Hill pp. 214-229 1982.
Chiong et al., "Contrast and sensitivity. . . ", J. Vac. Sci. Technol., B vol. 6(6) Nov./Dec. 1988.
Abstract of JP 01-214863.
Elliott "Integrated Circuit Fabrication Technology"(.COPYRGT.1982) pp. 214-229.

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