Developing device for semiconductor device fabrication and its c

Details Developing device for semiconductor device fabrication and its c Developing device for semiconductor device fabrication and its c

1997-11-13

1999-07-27

Rutledge, D.

Photography

Fluid-treating apparatus

Fluid application to one side only of photographic medium

396612, 396627, 118 52, 427240, 427384, G03D 500

Patent

active

059305495

ABSTRACT:
A developing device for a semiconductor device fabrication accomplishes complete removal of by-products formed during development of a photoresist, by inverting the wafer over a container of developer and dipping the pattern-forming face into the developer. While the wafer is still inverted over the container, the pattern-forming face is sprayed with a rinse and the wafer is spun to remove the rinse and by-products. The device includes the container provided on a table and supplied with developer, a spin chuck using vacuum suctioning the face of the wafer opposite to the pattern-forming face, a driving motor for rotating the spin chuck, a vertical driver for moving the wafer into and out of the container, and an inverting driver for rotating the spin chuck and the vertical driver so as to selectively turn the pattern-forming face of the wafer to look upward or downward.

REFERENCES:
patent: 4851263 (1989-07-01), Ishii et al.

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