Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Finishing or perfecting composition or product
Patent
1989-08-16
1991-03-05
Michl, Paul R.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Finishing or perfecting composition or product
430192, 430193, 430326, G03C 500, G03C 152
Patent
active
049977482
ABSTRACT:
The developer solution of the invention is suitable for use to develop a positive-working resist composition comprising an alkali-soluble novolac resin and a naphthoquinone diazide compound and capable of giving a patterned image of the resist layer with a high contrast and increasing the effective depth of focus. The characteristic ingredient in the inventive developer solution is an alkali-soluble organic cyclic nitrogen compound such as N-hydroxyethyl piperazine, N-methyl-4-piperidone, 1,3-dimethyl-2-imidazolidinone and the like added in a specified concentration to a conventional developer solution containing tetramethyl ammonium hydroxide or choline as the water-soluble alkaline compound.
REFERENCES:
patent: 4729941 (1988-03-01), Itoh et al.
patent: 4744834 (1988-05-01), Haq
patent: 4820621 (1989-04-01), Tanka et al.
Chemical Abstracts: Cho, Developers for positive-working photoresists, 105819n, 1989.
Chemical Abstracts, 46231y, (vol. III), 1988.
Chemical Abstracts, 14284p, (vol. 112), 1990.
Nakayama Toshimasa
Takeda Yasuyuki
Tanaka Hatsuyuki
Chu John S. Y.
Michl Paul R.
Tokyo Ohka Kogyo Co. Ltd.
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