Developer solution for photolithographic patterning

Details Developer solution for photolithographic patterning Developer solution for photolithographic patterning

1997-06-05

1999-01-26

Le, Hoa Van

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Finishing or perfecting composition or product

430294, 430311, 430314, 430319, 430325, 510171, 510176, G03F 730

Patent

active

058637109

ABSTRACT:
Proposed is an aqueous alkaline developer solution used in the development treatment of a photoresist layer, especially, formed on an aluminum surface of a substrate. Different from conventional aqueous alkaline developer solutions which attack the aluminum surface in the development treatment to cause discoloration or corrosion, the inventive developer solution is free from such troubles by virtue of the specific formulation including, besides 2 to 10% by weight of tetramethylammonium hydroxide as the effective developing ingredient, 20 to 50% by weight of a polyhydric alcohol which is preferably glycerin.

REFERENCES:
patent: 4822723 (1989-04-01), Phillon
patent: 5252436 (1993-10-01), Binder et al.

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