Developer solution comprising ethyl hexyl sulphate, a surfactant

Details Developer solution comprising ethyl hexyl sulphate, a surfactant Developer solution comprising ethyl hexyl sulphate, a surfactant

1990-11-06

1994-01-11

Wright, Lee C.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Finishing or perfecting composition or product

430157, 430165, 430176, 430192, 430278, 430302, 252 86, 252156, 25217421, G03F 732, G03F 7016, G03F 7023, C11D 118

Patent

active

052780309

ABSTRACT:
A developer liquid for image-wise exposed radiation sensitive compositions comprises ethyl hexyl sulphate, a surfactant, and alkaline material such that the pH is al least 12 and preferably at least 13.5. The developer liquid may additionally include a water soluble carboxylic acid salt such as sodium octanoate and the sodium salt of ethylene diamine tetra acetic acid. Such developer liquids can be formulated for use with both positive-working and negative-working compositions.

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