Developer solution and process for use

Details Developer solution and process for use Developer solution and process for use

2006-08-22

2006-08-22

Le, Hoa Van (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Finishing or perfecting composition or product

C430S311000, C430S322000

Reexamination Certificate

active

07094523

ABSTRACT:
An improved composition and method for the development of resists is disclosed. The method comprises contacting the resist with a developer solution comprising a source of alkalinity and a cationic surfactant which is an ethoxylated and/or propoxylated tallow amine. The improved developer solution more effectively removes the uncured resist from the resist coated surface.

REFERENCES:
patent: 5922522 (1999-07-01), Barr et al.
patent: 6063550 (2000-05-01), Lundy et al.
patent: 6248506 (2001-06-01), Lundy et al.
patent: 6296694 (2001-10-01), Miller
patent: 2005/0100833 (2005-05-01), Anzures et al.

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