Developer mixture and process for developing exposed negative-wo

Details Developer mixture and process for developing exposed negative-wo Developer mixture and process for developing exposed negative-wo

1982-01-06

1983-07-26

Downey, Mary F.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making printing plates

430175, 430325, 430331, G03C 158, G03C 530

Patent

active

043954804

ABSTRACT:
The invention relates to a developer mixture for developing exposed, light-sensitive reproduction layers which contain a diazonium salt polycondensation product. The mixture comprises water, a salt of an alkanoic acid and a surfactant and contains 0.5 to 15 percent by weight, in particular 1 to 10 percent by weight, of at least one salt of an alkanoic acid having 8 to 13 carbon atoms and 0.5 to 20 percent by weight, in particular 1 to 12 percent by weight, of at least one low-foaming, nonionic surfactant. These surfactants preferably include optionally modified block polymers formed from ethylene oxide and propylene oxide.
The invention also relates to a process for developing negative-working reproduction layers, of the composition indicated above, with the developer mixture according to the invention.

REFERENCES:
patent: 3201241 (1965-08-01), Munder et al.
patent: 3208949 (1965-09-01), Rosnati
patent: 3669660 (1972-06-01), Golda et al.
patent: 3701657 (1972-10-01), Moore et al.
patent: 4147545 (1979-04-01), Rowe et al.
patent: 4186006 (1980-01-01), Kobayashi et al.
patent: 4350756 (1982-09-01), Burch et al.

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