Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Finishing or perfecting composition or product
Patent
1984-12-21
1986-03-18
Downey, Mary F.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Finishing or perfecting composition or product
430309, G03C 500, G03F 700
Patent
active
045769036
ABSTRACT:
A developer suitable for use with positive photoresists is based on a buffered aqueous-alkaline solution containing non-ionic surfactants and contains in the solution 1-100 ppm of the surfactants, preferably of the ethoxylated-alkylphenol type. The resultant photoresist shows outstanding properties with respect to the resolution and edge sharpness obtainable in the developed resist image and with respect to its developing activity, developing capacity and stability.
REFERENCES:
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patent: 4001133 (1977-01-01), Sorgenfrei et al.
patent: 4053314 (1977-10-01), Kimura et al.
patent: 4147545 (1979-04-01), Rowe et al.
patent: 4212902 (1980-07-01), Lopez
patent: 4263392 (1981-04-01), Jones
patent: 4374920 (1983-02-01), Wanat et al.
Baron Winfried
Marquard Kurt
Merrem Hans-Joachim
Sindlinger Raimund
Thiel Klaus-Peter
Downey Mary F.
Merck Patent Gesellschaft mit beschrankter Haftung
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