Developer for photosensitive polyimide precursor, and method of

Details Developer for photosensitive polyimide precursor, and method of Developer for photosensitive polyimide precursor, and method of

1999-03-04

2000-11-14

Le, Hoa Van

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Finishing or perfecting composition or product

G03F 732

Patent

active

061468150

ABSTRACT:
The invention provides a developer for photosensitive polyimides, with which polyimide patterning for interlayer insulating films for multi-layered circuit boards and for .alpha.-ray shield layers, buffer coat layers and others for semiconductor memory devices is attained within a shorter period of time than with conventional developers. It provides a developer for photosensitive polyimide precursors, which comprises two or more solvents including at least an aprotic polar solvent, and in which the mixed solution of the solvents has a polar component solubility parameter, .delta.P, of not smaller than 7, and provides a patterning method of using the developer.

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Interchemical Review, vol. 14, No. 1, 1955, pp. 3-16; "Solubility Parameters, Part I", Harry Burrell, XP002134913.
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