Developer for light-sensitive lithographic printing plate capabl

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Finishing or perfecting composition or product

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430149, 430154, 430302, 430309, G03C 500

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active

051067242

ABSTRACT:
There are disclosed an aqueous alkaline developer for light-sensitive lithographic printing plate commonly processing a negative-type light-sensitive lithographic printing plate having a light-sensitive layer containing a diazo compound and a positive-type light-sensitive lithographic printing plate having a light-sensitive layer containing an o-quinonediazide compound, which comprises containing an alkali agent, 0.1 to 10% by weight of a water-soluble reducing agent, a sodium, potassium or ammonium salt of an organic carboxylic acid, and a non-ionic or cationic surfactant, and having a pH in the range of 12.5 to 13.5, and also a developer composition for light-sensitive material, which comprises an aqueous solution containing a compound represented by the formula (I) shown below: ##STR1## wherein R.sub.1 represents an alkyl group or an alkoxy group each having 2 to 5 carbon atoms, or a hydroxyalkyl group having 2 to 5 carbon atoms; and R.sub.2 represents a hydrogen atom, a halogen atom, an amino group, a hydroxyl group, an alkyl group, an alkoxy group or a phenyl group.

REFERENCES:
patent: 3891439 (1975-06-01), Katz et al.
patent: 4530895 (1985-07-01), Simon et al.
patent: 4579811 (1986-04-01), Schell et al.
patent: 4780396 (1988-10-01), Hsieh et al.
Japanese Abstract No. 62-25761, vol. 11, No. 203 (P-591) (2650), Jul. 2, 1987.
Research Disclosure, No. 18620, Oct. 1979, pp. 575-576.

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