Developer for irradiated, radiation-sensitive recording material

Details Developer for irradiated, radiation-sensitive recording material Developer for irradiated, radiation-sensitive recording material

1998-11-03

1999-10-26

Le, Hoa Van

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Finishing or perfecting composition or product

430444, 430466, 430493, G03C 530

Patent

active

059725729

ABSTRACT:
A developer for irradiated, radiation-sensitive recording materials, in particular for the production of offset printing plates, which contains water, a compound which is alkaline in aqueous solution and a copolymer which acts as an emulsifier and has units of (I) a hydrophobic vinyl compound which has alkyl radicals having up to 30 carbon atoms and (II) a hydrophilic, ethylenically unsaturated carboxylic acid. Some of the carboxyl groups of the copolymer are esterified with reaction products of (A) (C.sub.1 -C.sub.30)alkanols, (C.sub.8 -C.sub.25)alkanoic acids, (C.sub.1 -C.sub.12)alkylphenols or di(C.sub.1 -C.sub.20)alkylamines with (B) (C.sub.2 -C.sub.4)alkylene oxides or tetrahydrofuran.

REFERENCES:
patent: 3954472 (1976-05-01), Walls
patent: 4716098 (1987-12-01), Mack et al.
patent: 5008032 (1991-04-01), Diessel et al.
patent: 5009805 (1991-04-01), Perner et al.
patent: 5368982 (1994-11-01), Suzuki et al.

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