Developer composition for resists and method for formation...

Details Developer composition for resists and method for formation... Developer composition for resists and method for formation...

2004-06-22

2010-12-07

Le, Hoa V (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

C430S309000

Reexamination Certificate

active

07846640

ABSTRACT:
A developer composition for resists which has a high dissolution rate (high developing sensitivity). The developer composition for resists comprises an organic quaternary ammonium base as a main component and a surfactant containing an anionic surfactant represented by formula (I).

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