Developer composition for positive photoresists using solution w

Details Developer composition for positive photoresists using solution w Developer composition for positive photoresists using solution w

1983-12-21

1985-12-03

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Finishing or perfecting composition or product

430326, 430329, 430323, 252541, 252547, 252548, 252542, G03C 534, C11D 328, C11D 330, C11D 732

Patent

active

045566291

ABSTRACT:
A method of developing a positive photoresist layer which has been image-wise-exposed comprising contacting the layer with an alkaline developing composition to remove exposed areas of the layer, the developing composition comprising a solution containing a cyclic quaternary ammonium hydroxide developing agent in a sufficient concentration to remove exposed areas of the layer. The present invention also includes a developing composition for use in the method.

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patent: 4411981 (1983-10-01), Minezaki
patent: 4464461 (1984-08-01), Guild
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