Determination of focal plane for a scanning projection aligner

Details Determination of focal plane for a scanning projection aligner Determination of focal plane for a scanning projection aligner

1987-06-01

1988-11-22

Evans, F. L.

Optics: measuring and testing

Focal position of light source

G01B 900

Patent

active

047861665

ABSTRACT:
An improved pattern of lines (26, 28) is placed on a wedged substrate (18) used to locate the focal plane of a scanning projection aligner. This pattern replaces the conventional array of microscopic resolution targets with large regions of microscopic lines and spaces. When printed, in- and out-of-focus conditions are macroscopically apparent due to the presence or absence of photoresist (14). Desired quantities conventionally determined from microscopic data, such as location of the best focus plane, astigmatism, mask-to-wafer parallelism, mirror aberrations and misalignments, are macroscopically determined in accordance with the invention.

REFERENCES:
IBM Technical Disclosure Bulletin, vol. 29, No. 2, Jul. 1986, pp. 681 and 682.

Affiliated with

Also associated with

Rating

Determination of focal plane for a scanning projection aligner does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Determination of focal plane for a scanning projection aligner, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Determination of focal plane for a scanning projection aligner will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-432065