Deterioration resistant chambers for inductively coupled...

Details Deterioration resistant chambers for inductively coupled... Deterioration resistant chambers for inductively coupled...

2005-09-20

2005-09-20

Lee, Wilson (Department: 2821)

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

C156S345350, C315S111210

Reexamination Certificate

active

06946063

ABSTRACT:
In one aspect of the invention is a method to construct plasma chambers with improved wall resistance to deterioration. In one embodiment of the invention, a chamber is made of an aluminum alloy having low concentrations of elements that form non-soluble, intermetallic particles to address coating/substrate issues, has swaged-in cooling tubes to reduce thermal stress by improving thermal resistance, and has a plurality of dielectric gaps to decrease ion bombardment.

REFERENCES:
patent: 6203620 (2001-03-01), Moslehi
patent: 6679981 (2004-01-01), Pan et al.
patent: 6815633 (2004-11-01), Chen et al.

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