Detection of undesired connection between conductive structures

Active solid-state devices (e.g. – transistors – solid-state diode – Test or calibration structure

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

257797, H01L 2358, H01L 23544

Patent

active

060547219

ABSTRACT:
The present invention is a device and method for detecting undesired connection between conductive structures within multiple layers on a semiconductor wafer during fabrication of an integrated circuit on the semiconductor wafer. The present invention includes a first conductive structure fabricated within a first layer on the semiconductor wafer and a second conductive structure fabricated within a second layer on the semiconductor wafer. The present invention also includes an interlevel of an insulating material disposed between the first layer and the second layer for separating the first layer from the second layer. The present invention further includes a contact structure of conductive material disposed within the interlevel of the insulating material. The contact structure is connected to the first conductive structure, and the contact structure becomes undesirably connected to the second conductive structure from at least one of: sufficient misalignment of at least one of the first layer, the second layer, and the interlevel of insulating material; sufficient proximity effect on at least one of the first conductive structure, the second conductive structure, and the contact structure; and sufficient defects in at least one of the second layer and the interlevel of insulating material. In addition, the present invention includes a detector for determining when the contact structure is undesirably connected to the second conductive structure. The first conductive structure may have a comb structure with a respective contact structure connected to each tooth of the comb structure. In that case, the second conductive structure surrounds three sides of the respective contact structure.

REFERENCES:
patent: 5699282 (1997-12-01), Allen et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Detection of undesired connection between conductive structures does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Detection of undesired connection between conductive structures , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Detection of undesired connection between conductive structures will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-995173

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.