Optics: measuring and testing – Inspection of flaws or impurities – Surface condition
Reexamination Certificate
2006-03-21
2006-03-21
Lauchman, Layla G. (Department: 2877)
Optics: measuring and testing
Inspection of flaws or impurities
Surface condition
C356S446000
Reexamination Certificate
active
07016029
ABSTRACT:
Detecting decay of equipment lens anti-reflective coating (ARC) by detecting undesired residue is disclosed. The undesired residue detected correlates with the decay of the ARC, where a greater amount of undesired residue detected indicates a greater level of the decay. The undesired residue is detected due to stray light reflected by the ARC because of its decay. In the context of semiconductor fabrication equipment, photoresist residue results from negative photoresist on a semiconductor wafer, and may be viewed on one or more scribe lines of a mask within a field of view of the lens of the semiconductor fabrication equipment.
REFERENCES:
patent: 5825486 (1998-10-01), Zavislan et al.
Chen Hung-Chih
Chin Hsien-Wei
Shih Niahn-Mauh
Wang Chao-Hsiung
Lauchman Layla G.
Taiwan Semiconductor Manufacturing Co. Ltd.
Tung & Assoc.
Valentin, II Juan D.
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